5 SIMPLE STATEMENTS ABOUT GIGASPIN 88 EXPLAINED

q to manage “EUV” masks and “EUV” reticles created for integrated circuits, not specified by 3B001.g, and getting a mask “substrate blank” specified by 3B001.j.” A technological Be aware is added to explain that masks or reticles that has a mounted pellicle are regarded masks and reticles. BIS is revising paragraph (d) to revise the